COATING FORMATION BASED ON CO-CR ALLOY BY MAGNETRON SPUTTERING FOR HARD MAGNETIC DISKS

  • S.P. Malyukov Southern Federal University
  • A. V. Saenko Southern Federal University
  • J. V. Klunnikova Southern Federal University
  • S. S. Zinoviev Southern Federal University
  • D. V. Timoshchenko Southern Federal University
Keywords: Storage device, hard magnetic disks, perpendicular method of recording information, ferromagnetic films, magnetron sputtering system, Co-Cr film research

Abstract

We consider the problem of increasing the volume of hard magnetic disks (HDD) memory. The
key place in the series of external computer storage devices is occupied by hard disk, because the
volume of information storage in them is constantly growing. We analyze the methods of information
recording for HDD. Thin magnetic film is the storage medium in hard disks. Thin-film technology is
mainly used for thin films formation. We consider the main principles of choosing the ferromagnetic
film composition based on the technical requirements for a hard magnetic disk, its geometric and
functional features. The comparative characteristics of various methods for thin films producing are
given. Nowadays the method of magnetron sputtering is intensively developed, providing controlled
sputtering of thin layers with the required parameters. When the target of the magnetron sputtering
device is used repeatedly, an erosion zone is formed in it, which directly affects the sputtering rate of
the material (film thickness). The thin film thickness decrease leads to a deterioration in the electrical
resistivity, i.e. to the irreproducibility of the required characteristics and parameters. We consider
the advantages of the magnetron sputtering method. The choice of coating materials that ensure the
performance of hard magnetic disks is the main factor for the technological design of magnetron
sputtering processes. We analyze the possibility of using Co-Cr pheromagnetic films for hard magnetic disks. The dependences of the influence of the substrate material on the magnetic properties of
ferromagnetic films, the effect of the deposition rate of Co films by magnetron sputtering on the coercive
force of ferromagnetic films, and the effect of the temperature of the substrate on the properties
of Co-Cr films are defined. We present the main parameters of the coating process by magnetron
sputtering for various ferromagnetic materials. The samples based on Co-Cr thin magnetic films
meet modern requirements in terms of increasing the recording density of hard magnetic disks. The
large coercive forces and values of relative remanent magnetization can be achieved in them.

References

1. Lobanov B.S., Pikul' A.I., Khlopov B.V. Metody povysheniya effektivnosti zashchity informatsii,
khranyashcheysya v nakopitelyakh na zhestkikh magnitnykh diskakh [Methods for increasing the
efficiency of protection of information stored in hard disk drives], T-Comm - Tele-kommunikatsii i
Transport [T-Comm – Telecommunications and Transport], 2009, No. 4, pp. 8-13.
2. Gitlits M.V. Magnitnaya zapis' signalov [Magnetic recording of signals]. Moscow: Radio i
svyaz', 1990, 225 p.
3. Karpenkov S.Kh. Magnitnye nositeli informatsii [Magnetic information carriers]. Moscow:
Radio i svyaz', 1993, 504 p.
4. Panfilov Yu.V. Nanesenie tonkikh plenok v vakuume [Deposition of thin films in vacuum],
Tekhnologii v elektronnoy promyshlennosti [Technologies in the electronic industry],
2007, No. 3, 72 p.
5. Berlin E.V., Seydman L.A. Ionno-plazmennye protsessy v tonkoplenochnoy tekhnologii [Ionplasma
processes in thin-film technology]. Moscow: Tekhnosfera, 2010, 528 p.
6. Adas'ko V.I., Kagan B.M. Pats V.B. Osnovy proektirovaniya zapominayushchikh ustroystv
bol'shoy emkosti [Fundamentals of designing storage devices of large capacity]. Moscow:
Energoizdat, 1984.
7. Palienko A.N., Epremyan V.B., Tolmachev V.A., Kashuba P.I. Izgotovlenie zhestkikh
magnitnykh diskov magnetronnym raspyleniem [Production of hard magnetic disks by magnetron
sputtering], Elektronnaya promyshlennost' [Electronic industry], 1987, 2T(33).
8. Starodubtsev Yu.N. Magnitomyagkie materialy [Soft magnetic materials]. Moscow:
Tekhnosfera, 2011, 659 p.
9. Malyukov S.P. Silenok A.B. Fiziko-tekhnologicheskie aspekty povysheniya nadezhnosti
izgotovleniya magnitnykh plenok [Physicotechnological aspects of increasing the reliability of
manufacturing magnetic films], Tr. mezhdunarodnogo simpoziuma «Nadezhnost' i kachestvo»
[Proceedings of the international symposium Reliability and quality], 2013, Vol. 2, pp. 191-193.
10. Utkin K.E. Upravlyaemyy sintez tonkikh plenok, poluchennykh metodom magnetronnogo
raspyleniya [Controlled synthesis of thin films obtained by magnetron sputtering], Upravlenie.
Kontrol' [Management. Control], 2018, No. 2 (24), pp. 41-46.
11. Dostanko A.P. Raschet elementnogo sostava tonkoplenochnykh sloev pri magnetronnom
raspylenii mozaichnykh misheney [Calculation of the elemental composition of thin-film layers
during magnetron sputtering of mosaic targets], Elektronnaya obrabotka materialov [Electronic
processing of materials], 2012, No. 1 (48), pp. 63-72.
12. Sagatelyan G.R. Analiz raspredeleniya tolshchiny tonkoplenochnogo pokrytiya pri
magnetronnom napylenii na ustanovkakh s planetarnym peremeshcheniem podlozhki [Analysis
of the distribution of the thickness of a thin-film coating during magnetron sputtering in
plants with planetary movement of the substrate], Nauka i obrazovanie [Science and education],
2014, pp. 458-481.
13. Yur'ev Yu.N., Mikhnevich K.S., Krivobokov V.P. Svoystva plenok nitrida titana, poluchennykh
metodom magnetronnogo raspyleniya [Properties of titanium nitride films obtained by magnetron
sputtering], Izvestiya Samarskogo nauchnogo tsentra Rossiyskoy akademii nauk [Bulletin
of the Samara Scientific Center of the Russian Academy of Sciences], 2014, Vol. 16, No. 4
(3), pp. 672-676.
14. Dzhumaliev A.S., Nikulin Yu.V. Vliyanie davleniya argona na teksturu i mikrostrukturu plenok
kobal'ta, osazhdaemykh magnetronnym raspyleniem [Influence of argon pressure on the texture and
microstructure of cobalt films deposited by magnetron sputtering], Izv. Sarat. Un-ta. Nov. Ser. Ser.
Fizika [Izv. Sarat. University. New Ser. Ser. Physics], 2017, Vol. 17, Issue 4, pp. 255-262.
15. Vasil'ev V.A. Uslovie polucheniya odnorodnykh nanorazmernykh rezistivnykh plenok NI-Ti
metodom magnetronnogo raspyleniya iz dvukh istochnikov [The condition for the production
of homogeneous nanoscale resistive NI-Ti films by magnetron sputtering from two sources],
Izvestiya Tomskogo politekhnicheskogo institute [News of the Tomsk Polytechnic Institute],
2014, pp. 173-179.
16. Timakov S.V. Eksperimental'nye issledovaniya kharakteristik magnetronnogo raspyleniya [Experimental
studies of the characteristics of magnetron sputtering], 2007, No. 32, pp. 132-136.
17. Berlin E.V., Seydman.L.A. Poluchenie tonkikh plenok reaktivnym magnetronnym raspyleniem
[Preparation of thin films by reactive magnetron sputtering]. Moscow: Tekhnosfera, 2014, 256 p.
18. Sheyn E.P. Vakuumnye tekhnologii [Vacuum technology]. Moscow: Intellekt, 2009, 504 p.
19. Kuz'michev A.I. Magnetronnye raspylitel'nye sistemy. Vvedenie v fiziku i tekhniku
magnetronnogo napyleniya [Magnetron Spray Systems. Introduction to the physics and technology
of magnetron sputtering]. K.: Avers, 2008, 244 p.
20. Malyukov S.P., Kovalev A.V., Zinoviev S.S., Starykh A.A. Multilayer Magnetic Films for Hard
Disks, International Journal of Applied Engineering Research, Vol. 12, pp. 11874-11877.
Published
2020-02-26
Section
SECTION I. ELECTRONICS AND NANOTECHNOLOGY