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Izvestiya SFedU
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ISSN 1999-9429 print
ISSN 2311-3103 online
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  • LOGIC CELL FOR VLSI BASED ON FIELD-EFFECT TRANSISTORS WITH P-N JUNCTIONS

    P.G. Gritzaenko, L. А. Svetlichnaya
    97-106
    2025-08-01
    Abstract ▼

    In the 80s of the last century, integrated injection logic (I2L) was widely used as an element
    base. Somewhat later, injection-field logic (IPL) appeared in the development of I2L capabilities
    for building VLSI. Thanks to the use of a field-effect transistor as a key element of the inverter, in
    this element basis it was possible to significantly reduce an important indicator for VLSI – power
    consumption - reaching the peak-watt range. An even greater reduction in power consumption can
    be achieved by using two field-effect transistors in the inverter unit cell, which is proposed in this
    paper. This element basis is proposed to be called field-field logic, or in the future P2L. To reduce
    the dimensions of the P2L cell, field-effect transistors, both key and load, are made with a vertical
    channel. In addition, to ensure a positive supply voltage, an n-channel transistor is used as a key
    one, and a p–channel transistor is used as a load one. Both transistors are normally closed, i.e.
    closed at zero gate voltage. Topological variants of P2L-cell execution from geometry with annular
    gates to geometry with linear gates proposed by the author earlier are considered. The topological
    norms adopted in the consideration are the norms of 50 nm. The power consumption in this
    element basis is reduced by about two times compared to the IPL, due to the fact that the current
    flows through the load transistors in the inverter chain through one inverter, as well as through
    the key ones. The technological process of manufacturing a P2L cell is considered, the profiles of
    the distribution of impurities in depth are calculated. The manufacturing process is designed taking
    into account the fact that the load p-channel transistor must be made in an insulated pocket
    using full dielectric insulation technology. The technological modes of manufacturing the P2L cell
    are given. The proposed design and technological variant of the P2L cell can be recommended for
    the creation of VLSI with low power consumption

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