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The article presents the results of the development of nanoscale memristive structures, the application
of which is promising for the hardware implementation of artificial intelligence systems. A design of a
memristive cell based on a titanium oxide film with a thickness ranging from 3 to 50 nm is proposed.
The upper electrode of the cell features a profiled structure in the form of two high-aspect-ratio nanoscale
tip structures (HANTS), where one tip has a radius of 10 nm, and the radius of the second tip varies in the
range of 10 to 50 nm. Platinum was chosen as the material for the upper electrode due to its unique physicochemical
properties, including high chemical inertness across a wide range of temperatures and aggressive
environments, low electrical resistivity, and resistance to oxidation. These characteristics make
platinum an optimal material for use in electronic devices and sensor systems where long-term stability
and minimal energy losses during signal transmission are required. The results of modeling the electric
field strength distribution in the interelectrode gap of the memristive cell are presented. The modeling was performed using COMSOL Multiphysics software, which solves systems of nonlinear partial differential
equations using the finite element method, with a potential difference of 5 V between the electrodes. Based
on the modeling results, the dependencies of the electric field strength on the geometric parameters of the
memristive cell were obtained and analyzed. Local enhancement of the electric field strength was identified
along the perimeter of the oxide-HANTS interface. The increase in the non-uniformity of the electric
field strength grows with the thickness of the oxide film and can reach 13.4%. The obtained results can be
used in the development of neuromorphic electronic components for robotic systems and artificial intelligence
systems based on memristors